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For Silicon wafers, is Thermal Oxide a single side or double side process?

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For Silicon wafers, is Thermal Oxide a single side or double side process?

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Thermal oxide is a double side process. It is grown in a tube style furnace using heat and oxygen or water vapor to oxidize the surface of the silicon, creating a layer of silicon dioxide (Oxide). Everywhere that silicon is exposed oxide will grow, even around the very edges of the wafer.

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