What is an Ion Implant?
Ion implantation has applications in several different industries, most notably in the making of semiconductors. An ion implant is an ion of a particular element, placed in its surrounding material for the purpose of changing the electrical or surface properties of the material. Some common elements that can be used in ion implantation are phosphorous, arsenic, boron, and nitrogen. The science of ion implantation has been known since the 1950s, but was not in wide use until the 1970s. A machine called a mass separator is used to implant ions in their destination material, which is called the “substrate” for scientific purposes. In a typical setup, ions are produced at a source point and then accelerated toward a separation magnet, which effectively concentrates and aims the ions toward their destination. The ions consist of atoms or molecules with a number of electrons which is higher or lower than usual, making them more chemically active. Upon reaching the substrate, these ions colli
